Dresden 2011 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films
DS 42.66: Poster
Mittwoch, 16. März 2011, 15:00–17:30, P1
Growth and optimization of YBa2Cu3O7−x-SrTiO3-multilayers — •Alexander Guillaume, Frank Ludwig, Jan M. Scholtyssek, and Meinhard Schilling — Institut für Elektrische Messtechnik und Grundlagen der Elektrotechnik, Technische Universität Braunschweig, Hans-Sommer-Str. 66, D-38106 Braunschweig, Germany
YBa2Cu3O7−x (YBCO) is a commonly used high-Tc superconducting material. Lattice matched insulating materials, such as SrTiO3 (STO), are required for the fabrication of complex multilayer devices. We grow STO-YBCO multilayers on (100)-surfaces of STO-substrates via pulsed laser deposition (PLD). Here, the optimization of the PLD-parameters for the deposition of YBCO by using the technique of design of experiments (DOE) based on [1] is presented. Another DOE for optimizing the parameters of the insulating STO-films is currently carried out. The parameters varied are the energy density of the laser pulses, the oxygen partial pressure inside the recipient and the temperature of the substrate. The optimization took into account the morphological, electrical and superconducting properties of the films. Atomic-force-micrographs are presented to illustrate the film morphology. Screening measurements were performed to investigate the superconducting transition characteristics and the homogeneity of the YBCO-layer while the van der Pauw-method was used to determine the thin film-resistivity.
[ 1] J.K. Heinsohn, D. Reimer, A. Richter, K.O. Subke, and M. Schilling, Physica C 299 (1998) 99-112.