Dresden 2011 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 42: Poster I: Progress in Micro- and Nanopatterning: Techniques and Applications (jointly with O); Spins in Organic Materials; Ion Interactions with Nano Scale Materials; Organic Electronics and Photovoltaics; Plasmonics and Nanophotonics (jointly with HL and O); High-k and Low-k Dielectrics (jointly with DF); Organic Thin Films; Nanoengineered Thin Films; Layer Deposition Processes; Layer Properties: Electrical, Optical, and Mechanical Properties; Thin Film Characterisation: Structure Analysis and Composition; Application of Thin Films

DS 42.92: Poster

Mittwoch, 16. März 2011, 15:00–17:30, P1

Low Energy SEM - High Resolution, Low Charging, Low Damage — •Philipp Tonndorf, Steffen Schulze, and Michael Hietschold — Chemnitz University of Technology, Reichenhainer Straße 70, D-09126 Chemnitz, Germany

With the usage of slow primary electrons in the scanning electron microscope it is possible to achieve more valueable images with respect to resolution, charging and damage. The primary electrons are accelerated as usual with some kV. Then after the last lens they are slowed down to some hundreds of eV through an opposing field. So the interaction volume shrinks and one gets higher resolution and better signal-noise-ratio. Another effect is a higher surface sensitivity. Through the smaller landing energy the SE and BSE yield changes. If the total yield is 1 no charging occurs. So it is possible to investigate insulators with no metal coating. With very slow primary electrons (< 50 eV) the damaging of organics and the carbon contamination decreases. At about 25 eV there is no more damage observed through ionisation. At this energy backscattering becomes inversely proportional to the local density of states. Carbon contamination stops at about 4 eV.