Dresden 2011 – wissenschaftliches Programm
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HL: Fachverband Halbleiterphysik
HL 85: Poster Session II
HL 85.77: Poster
Donnerstag, 17. März 2011, 18:00–21:00, P4
Transmission Electron Microscopy for thin film solar cells — •Nies Reininghaus1, Vitalij Schmidt1, Wiebke Hachmann1, Stefan Gruss2, Helmut Stiebig2, and Ulrich Heinzmann1 — 1Molecular and Surface Physics, Bielefeld University — 2Malibu GmbH & Co. KG, Bielefeld
Thin-film amorphous and microcrystalline silicon are promising materials for photovoltaics as they have the potential to reduce the solar cell costs. In case of microcrystalline silicon the crystalline volume fraction is related to the efficiency factor of solar cells because it provides information about the microstructure of the material and the defect density. With Transmission Electron Microscopy of cross-sections it is possible to show the microstructure of the cells. However to determine the structure of the bulk it is necessary to analyse the diffraction of the electron beam. For the purpose of imaging diffraction patterns and displaying dark fields a new camera system has been installed in the Phillips CM200. With much higher sensitivity and a larger photoactive area it is possible to take images of the low-intensity diffraction and the dark field patterns.