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Dresden 2011 – wissenschaftliches Programm

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KR: Fachgruppe Kristallographie

KR 5: Poster Multiferroics (Joint Session of MA, DF, DS, KR, TT)

KR 5.98: Poster

Dienstag, 15. März 2011, 10:45–13:00, P2

Spin wave resonances in ferromagnetic thin films prepared via atomic layer deposition — •Rupert Huber1, Paul Berberich1, Thomas Schwarze1, Thomas Rapp1, Julien Bachmann2, Kornelius Nielsch2, and Dirk Grundler11Lehrstuhl für Physik funktionaler Schichtsysteme, Physik Department E10, Technische Universität München,85748 Garching, Germany — 2Institut für Angewandte Physik und Mikrostrukturzentrum, Universität Hamburg,20355 Hamburg, Germany

On the way to artificially designed three-dimensional magnetic devices atomic layer deposition (ALD) is a promising thin-film deposition technique. We have produced different ferromagnetic thin films by ALD based on the oxidation of FeCp2 and NiCp2 using ozone [Ref. 1] Afterwards the iron and nickel oxide, respectively, is reduced inside the ALD reactor by H2 at 400 C. We have studied the quasistatic and dynamic properties via the magneto-optical Kerr effect and broadband spin-wave spectroscopy, respectively. In the latter case we mount the thin film on top of a coplanar waveguide with an inner conductor exhibiting a width of 20 µ m. Using a vector network analyzer we measure spin wave resonances. They depend characteristically on an applied magnetic field. We thank Sebastian Neusser for experimental help in the initial stage of the experiment. We acknowledge financial support through the European Community*s Seventh Framework Programme (FP7/2007-2013) under Grant Agreement no. 228673 MAGNONICS. Ref. 1: J. Bachmann et al., JAP, 2009, 105, 07B521

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