Dresden 2011 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 63: Poster II (Surface Magnetism/ Magnetic Imaging/ Topological Insulators/ Spin Structures and Magnetic Phase Transitions/ Graphene/ Magnetic Thin Films/ Magnetic Semiconductors/ Magnetic Half-metals and Oxides/ Spin-dependent Transport/ Spin Excitations and Spin Torque/ Spin Injection and Spin Currents in Heterostructures/ Spintronics/ Magnetic Storage and Applications)
MA 63.60: Poster
Freitag, 18. März 2011, 11:00–14:00, P2
Sputtering deposition and characterization of epitaxial LSMO thin films — •Philipp M. Leufke, Ajay K. Mishra, Robert Kruk, and Horst Hahn — Karlsruher Institut für Technologie, Institut für Nanotechnologie, D-76344 Eggenstein-Leopoldshafen, Germany
We report on the heteroepitaxial deposition of La1−xSrxMnO3 (LSMO) thin films using RF and DC magnetron sputtering. Co-deposition from the two different LSMO targets with x=0.25 and x=0.35 was used to tailor the desired composition to control ferromagnetic Curie temperature of the films. The influence of different single crystalline substrates as well as the effect of varying the oxygen partial pressure on magnetic and structure properties during deposition was investigated. The chemical stoichiometry was determined by Rutherford backscattering spectroscopy (RBS). Transmission electron microscopy and high resolution X-ray diffractometry (HRXRD) confirmed epitaxial growth for substrates with low in-plane lattice mismatch. The temperature dependence of the electric resistance agrees with the TCurie determined by (zero) field-cooling (FC/ZFC) superconductive quantum interference device SQUID measurements.