Dresden 2011 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 36: Poster Session II (Metals; Nanostructures at surfaces; Surface or interface magnetism; Spin-Orbit Interaction at Surfaces; Electron and spin dynamics; Surface dynamics; Methods; Theory and computation of electronic structure)
O 36.2: Poster
Dienstag, 15. März 2011, 18:30–22:00, P4
Oxidation of Ruthenium Surfaces — •Marius Ernst1,2, Thanh-Nam Nguyen1, Sina Gusenleitner1,2, Dirk Ehm2, and Friedrich Reinert1,3 — 1University of Würzburg, Experimental Physics VII, Am Hubland, 97074 Würzburg, Germany — 2Carl Zeiss SMT GmbH, Rudolf-Eber-Strasse 2, Oberkochen, Germany — 3Karlsruhe Institute of Technology, Gemeinschafts Labor für Nano-Analytik, Germany
Multilayer mirrors for extreme ultraviolet (EUV) Lithography applications are threatened by various detoriation processes of the surface. During exposure, the dominating contamination processes are carbonization and oxidation due to adsorption of hydrocarbons and oxygen and their reaction with the mirror surface, reducing the mirror lifetime. One possibility to extent the lifetime is to coat the mirror with a dedicated capping material, such as Si, Ti, Mo, Pd, Ru, or their oxides. To study the influence of oxidative species (O2 and H2O), in this work Ru single crystals were used as model systems for real mirror capping layers. The (0001) surface of a Ru single crystal was exposed to oxidative environments with a total pressure ranging from 10 9 mbar to 10-4 mbar and analyzed with low energy electron diffraction (LEED), X-ray photoelectron spectroscopy (XPS) and ultra-violet photoelectron spectroscopy (UPS). Depending on pressure and exposure, different surface reconstructions could be found. At oxygen partial pressures higher than 10-4 mbar and sufficiently long oxygen exposure, bulk oxide formed, the thickness of which was analyzed with ellipsometry. The oxidation behaviour of single crystalline surfaces was compared with the oxidation of thin evaporated Ru layers.