Dresden 2011 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 60: Poster Session IV (Solid/liquid interfaces; Semiconductors; Oxides and insulators; Graphene; Plasmonics and nanooptics; Electronic Structure; Surface chemical reactions; Heterogeneous catalysis)
O 60.11: Poster
Mittwoch, 16. März 2011, 17:30–21:00, P4
STM characterization of MOVPE-prepared silicon surfaces — Peter Kleinschmidt, Sebastian Brückner, •Johannes Luczak, Oliver Supplie, Anja Dobrich, Henning Döscher, and Thomas Hannappel — Helmholtz-Zentrum Berlin für Materialien und Energie, Hahn-Meitner-Platz 1, 14109 Berlin, Germany
The clean Si(100) surface reconstructs by forming dimers, thus reducing the number of dangling bonds at the surface. In the MOVPE environment hydrogen is commonly used as process gas, which leads to a monohydride silicon surface with a 2×1 unit cell consisting of H-Si-Si-H dimers. Even so, the quality of the surface can vary dramatically depending on process conditions. In general, annealing in hydrogen leads to a two-domain surface structure with monoatomic steps, where the resulting structure also strongly depends on misorientation. We find process conditions for preparation of Si(100) surfaces with 0.1∘, 2∘ and 6∘ offcut where a strong preference for one domain is obtained, making the resulting surfaces ideal substrates for III-V-on-Si epitaxy. A process consisting of deoxidation, homoepitaxial buffer layer growth and annealing is found to result in DA-type double layer steps for 0.1∘, and DB-type double layer steps for 6∘ offcut. The identical process leads to single layer steps for 2∘ offcut. Here, we obtain DA-type double layer steps by a modified process which includes a slow cooling phase after the annealing step. Our results, verified by scanning tunneling microscopy, low energy electron diffraction and Fourier-transform infrared spectroscopy, are in sharp contrast to the clean and the hydrogenated Si(100) surface prepared in UHV.