Dresden 2011 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 60: Poster Session IV (Solid/liquid interfaces; Semiconductors; Oxides and insulators; Graphene; Plasmonics and nanooptics; Electronic Structure; Surface chemical reactions; Heterogeneous catalysis)
O 60.5: Poster
Mittwoch, 16. März 2011, 17:30–21:00, P4
Ionic Liquid on Cu(100) studied by X-ray Photoelectron Spectroscopy — •Ellen Fischermeier and Thomas Fauster — Lehrstuhl für Festkörperphysik, Universität Erlangen-Nürnberg, Staudtstr. 7, D-91058 Erlangen, Germany
Room temperature Ionic Liquids have attracted a lot of attention during the last years due to their extraordinary physical and chemical properties. As a number of important processes depend on the properties of the interface between Ionic Liquid and substrate, it is crucial to gain a deeper insight into the Ionic Liquid/surface interactions.
In this study films of [EMIm][Tf2N] of different thickness were deposited under UHV-conditions by physical vapor deposition on well defined Cu(100) single crystal surfaces using a home-built evaporator. These samples were studied by X-ray Photoelectron Spectroscopy under different emission angles.
We focus on the growth behavior of the films and the radiation induced changes observed in the Ionic Liquid and compare the results obtained at different layer thickness.