Dresden 2011 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 71: [DS] Organic Electronics and Photovoltaics II (jointly with CPP, HL, and O)

O 71.3: Vortrag

Donnerstag, 17. März 2011, 12:30–12:45, GER 38

Investigation of the chemical and electronic structure of F₁₆CoPc from Monolayer to thick films by photoemission spectroscopy — •M. Grobosch and M. Knupfer — IFW Dresden, D-01069 Dresden, Germany

We have grown F₁₆CoPc with different film thickness under ultra high vacuum conditions on polycrystalline Au surfaces. By means of combined X-ray and ultraviolet photoemission spectroscopy (XPS, UPS) we have investigated the chemical and electronic structure of the F₁₆CoPc films. Within the first monolayers we could identify a charge transfer from the substrate on the F₁₆CoPc molecules. Our results indicate a clear difference in the valence band spectra for sub-monolayer thin and several nm thick F₁₆CoPc films. Furthermore, for F₁₆CoPc the ionization potential can be changed by the fluorination of the molecules from 4.8 eV for CoPc to 6.5 eV for F₁₆CoPc. The investigated heterointerface CoPc/F₁₆CoPc can be characterized as free from chemical reactions.