Dresden 2011 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 71: [DS] Organic Electronics and Photovoltaics II (jointly with CPP, HL, and O)
O 71.3: Vortrag
Donnerstag, 17. März 2011, 12:30–12:45, GER 38
Investigation of the chemical and electronic structure of F16CoPc from Monolayer to thick films by photoemission spectroscopy — •M. Grobosch and M. Knupfer — IFW Dresden, D-01069 Dresden, Germany
We have grown F16CoPc with different film thickness under ultra high vacuum conditions on polycrystalline Au surfaces. By means of combined X-ray and ultraviolet photoemission spectroscopy (XPS, UPS) we have investigated the chemical and electronic structure of the F16CoPc films. Within the first monolayers we could identify a charge transfer from the substrate on the F16CoPc molecules. Our results indicate a clear difference in the valence band spectra for sub-monolayer thin and several nm thick F16CoPc films. Furthermore, for F16CoPc the ionization potential can be changed by the fluorination of the molecules from 4.8 eV for CoPc to 6.5 eV for F16CoPc. The investigated heterointerface CoPc/F16CoPc can be characterized as free from chemical reactions.