Berlin 2012 – wissenschaftliches Programm
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MM: Fachverband Metall- und Materialphysik
MM 23: Topical Session Bulk Nanostrucured Materials V - Microstructure and Characterization III
MM 23.1: Vortrag
Dienstag, 27. März 2012, 11:30–11:45, H 0107
X-ray line profile analysis of in-situ tensile deformation experiments of nanocrystalline palladium thin films — •Michael Kerber1, Patric Gruber2, Rudolf Baumbusch2, Jochen Lohmiller2, Anna Castrup3, Erhard Schafler1, Oliver Kraft2, Michael Zehetbauer1, and Horst Hahn3 — 1University of Vienna, Physics of Nanostructured Materials, Vienna, Austria — 2Karlsruhe Institute of Technology IAM II, Eggenstein-Leopoldshafen, Germany — 3Karlsruhe Institute of Technology INT, Eggenstein-Leopoldshafen, Germany
X-ray line profile analysis was used to study the evolution of the microstructural parameters in Pd with grain sizes around 30nm. The Pd-films of about 1 µm thickness were produced by sputtering of Pd onto a Kapton foil. X-ray profiles were measured during the tensile deformation at the MS-beamline of the synchrotron SLS, Villigen (Switzerland) at deformation temperatures of 20∘ C and 60∘ C. The samples were loaded/unloaded in two consecutive cycles to є∼ 0.2 and 0.4. The evaluation of the data yielded the detailed evolution of the median m and variance σ of an assumed log-normal size-distribution, the density of dislocations ρ and their arrangement M, and the frequency of planar defects β. The changes in the diffuse background scattering, related to the number of point defects of the material, was determined. Here it was found that the deformation is still ruled by dislocation plasticity. However, grain size mediated deformation gets increasingly active, and effects from vacancies play some role. Part of the Work supported by the Austrian Science Fund project S 10403