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O: Fachverband Oberflächenphysik
O 23: [DS] Focused electron beam induced processing for the fabrication of nanostructures II (focused session, jointly with O – Organizers: Huth, Marbach)
O 23.5: Talk
Tuesday, March 27, 2012, 11:15–11:30, H 0111
Electron Beam Induced Surface Activation of Oxide Surfaces for Nanofabrication — •Florian Vollnhals1, Tom Woolcot2, Steffen Seiler1, Marie-Madeleine Walz1, Hans-Peter Steinrück1, Geoff Thornton2, and Hubertus Marbach1 — 1Lehrstuhl für Physikalische Chemie II and Interdisciplinary Center for Molecular Materials (ICMM), Friedrich-Alexander-Universität Erlangen-Nürnberg, Egerlandstr. 3, 91058 Erlangen — 2London Centre for Nanotechnology and Department of Chemistry, University College London, 17-19 Gordon Street, London WC1H 0AH, UK
The controlled fabrication of structures on the nanoscale is a major challenge in science and engineering. Direct-write techniques like Electron Beam Induced Deposition (EBID) were shown to be suitable tools in this context. Recently, Electron Beam Induced Surface Activation (EBISA) has been introduced as a new focused electron beam technique. In EBISA, a surface, e.g. SiO2, is irradiated by a focused electron beam, resulting in an activation of the exposed area. The activated area can then react and decompose precursor gases like iron pentacarbonyl, Fe(CO)5. This leads to a primary deposit, which continues to grow autocatalytically as long as Fe(CO)5 is supplied, resulting in pure (>90%at.), crystalline iron nanostructures.[1] We expand the use of this concept by exploring EBISA to produce metallic nanostructures on TiO2(110) in UHV; atomistic insight into the process is obtained via Scanning Tunneling Microscopy (STM) and chemical insight via Auger Electron Specroscopy (AES). Supported by the DFG (MA4246/1-2).
[1] M.-M. Walz et al., Angew. Chem. Int. Ed. 49 (2010), 4669