Berlin 2012 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 35: Poster Session II (Polymeric biomolecular films; Nanostructures; Electronic structure; Spin-orbit interaction; Phase transitions; Surface chemical reactions; Heterogeneous catalysis; Particles and clusters; Surface magnetism; Electron and spin dynamics; Surface dynamics; Methods; Electronic structure theory; Functional molecules)
O 35.84: Poster
Dienstag, 27. März 2012, 18:15–21:45, Poster B
Thickness dependence of ion induced eletron emission — •Kevin Kusmierek1, Christian Haake1, Andreas Wucher1, Marika Schleberger1, and Detlef Diesing2 — 1Universität Duisburg-Essen, Fakultät für Physik, 47057 Duisburg, Germany — 2Universität Duisburg-Essen, Fakultät für Chemie, 45117 Essen, Germany
Ion bombardment of thin metal films leads to electronic excitations causing the well known secondary electron emission. When the film thickness is in the range of the excited carrier's mean free path, reflection of carriers at the back side of the film and subsequent passage through the front side to the vacuum may increase the secondary electron emission yield. This increase of the yield is influenced by the relaxation of the ion induced electronic excitation. Thus, we present a study on the thickness dependence of the secondary electron emission yield. Our metal films are evaporated on glass and AFM studies show a mean roughness of 3 nm. The films have thicknesses between 10 and 100 nm and are bombarded with keV Ar ions.