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K: Fachverband Kurzzeitphysik

K 1: Methoden und Verfahren

K 1.2: Talk

Monday, March 12, 2012, 15:00–15:15, V57.04

Temperature Measurement for Millisecond Annealing — Denise Reichel, Wolfgang Skorupa, and •Thomas Schumann — Helmholtz-Zentrum Dresden-Rossendorf, PF 51 01 19, 01314 Dresden

Millisecond Annealing (MSA) of advanced materials challenges temperature measurement by introducing extreme conditions.

Annealing processes in the milliseond time range use flash lamps for heating. These lamps allow for surface annealing, but they cause large background radiation leading to an inversion of the signal-to-noise ratio.

Pyrometry (Radiometry) has been used successfully for temperature measurement for longer annealing processes like Rapid Thermal Annealing (RTA). However, in the case of Surface Annealing Detector and Lamp Bank need to face the same side of the wafer (front typically). Taking into account the high background radiation of the flash lamps as well as the small time spans of a few milliseconds temperature measurement becomes very challenging for MSA.

This presentation intends to give a deeper understanding of the challenges of temperature measurement during MSA and it will give some examples to solve the matter.