Stuttgart 2012 – wissenschaftliches Programm

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P: Fachverband Plasmaphysik

P 14: Poster: Plasmatechnologie

P 14.14: Poster

Mittwoch, 14. März 2012, 16:30–19:00, Poster.III

Simulation of chemical processes for the deposition of SiO_xC_y and SiOx films produced by means of atmospheric pressure microplasma jet — •Katja Rügner, Rüdiger Reuter, Dirk Ellerweg, Teresa de los Arcos, Achim von Keudell, and Jan Benedikt — Ruhr-Universität Bochum

Atmospheric pressure microplasma jets exists in various designs and had proven to be able to deposit thin SiO₂ films from HMDSO ((CH₃)₃SiOSi(CH₃)₃) precursor. Through a modification of an already existing planar microplasma jet and the development of a fluid model of the gas flow and chemical kinetics we try to understand the HMDSO dissociation path in the plasma and in the effluent. To achieve that a quartz tube with variable length has been inserted between the electrodes to guide the gas. The residence time of reactive species in the effluent can be varied by changing the tube length. Using a mixture of He, HMDSO and O₂ thin organic SiO_xC_y and inorganic SiO_x films on silicon substrates has been produced. The dependence of deposition rates, deposition profiles and FTIR data has been used to validate the fluid model. Good agreement with the experimental results can be obtained by fitting the unknown reaction rates and surface reaction probabilities.