Stuttgart 2012 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 23: Plasmatechnologie I (Niederdruckkonzepte)
P 23.3: Fachvortrag
Freitag, 16. März 2012, 11:15–11:40, V57.01
The dynamics of pulsed reactive CCP discharges in response to thin film deposition and dust formation — •Brankica Sikimić1, Ilija Stefanović1, Nader Sadeghi2, and Jörg Winter1 — 1Institut für Experimental Physik II, Ruhr Universität Bochum, Germany — 2LIPhy, Universite Joseph Fourier & CNRS (UMR5588), Grenoble, France
Hydrocarbon decomposition in plasmas containing reactive gases (e.g. acetylene) leads to the formation of coatings on the reactor surfaces or particles in the plasma bulk. Our previous studies described the influence of the particles presence on various plasma parameters in the pulsed plasmas [1]. The effect of surface coatings is examined in a low-pressure CC discharge driven symmetrically at 13.56 MHz and pulsed with 100 Hz. Microwave interferometry and laser absorption spectroscopy are employed to determine electron and argon metastable (3P2) densities, respectively. The electrode floating voltage is measured simultaneously by external LC filters. Our results show that the steady-state electron and metastable densities in the power-on phase increase with larger film thicknesses. In the plasma afterglow, the diffusion of electrons and metastable atoms is slower, indicating reduced losses due to the presence of deposited film. Furthermore, the positive ion fluxes are determined from the change of the electrode floating voltage in the plasma afterglow. The estimation of ion densities in the discharge, calculated from ion fluxes, gives a reasonable agreement with measured electron densities and predicted model [1]. [1] I. Denysenko, et al: J. Phys. D, App.Phys. 44 (2011) 205204