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P: Fachverband Plasmaphysik

P 10: Poster: Plasmadiagnostik

P 10.16: Poster

Wednesday, February 27, 2013, 16:30–18:30, Poster EG

Time-resolved diagnostics of an ECWR assisted HiPIMS discharge for thin film deposition at low pressure — •Steffen Drache¹, Vitezslav Stranak¹, Ann-Pierra Herrendorf¹, Martin Cada², Zdenek Hubicka², and Rainer Hippler¹ — ¹Ernst-Moritz-Arndt Universität Greifswald, Institut für Physik, Felix-Hausdorff-Str. 6, 17489 Greifswald, Germany — ²Institute of Physics v. v. i., Academy of Science of the Czech Republic, Na Slovance 2, 182 21 Prague, Czech Republic

The ionization degree and energy of impinging plasma particles play a major role on the final chemical phase, degree of crystallinity, film density, and microstructure of the deposited layer. A low working pressure thus becomes more favorable to obtain more energetic ions due to the reduced collisionality in the plasma sheath in front of the substrate. For this reason a magnetron sputtering source equipped with a Ti target was built into a particular type of an inductively coupled plasma (ICP) source which makes use of the electron cyclotron wave resonance (ECWR) effect. The result is a facility that enables high power impulse magnetron sputtering (HiPIMS) at significantly reduced working pressure. Several time- and spatial-resolved diagnostics were employed to characterize the discharge: Langmuir probe was used to evaluate electron properties, while optical emission spectroscopy (OES), energy-dispersive mass spectrometry together with a retarding field energy analyzer (RFA) were used to investigate ions and other plasma active species in the discharge. Interestingly, a large fraction of double charged metal ions with high energies E > 200 eV was found.