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DS: Fachverband Dünne Schichten
DS 27: Thin Film Characterization: Structure Analysis and Composition (XRD, TEM, XPS, SIMS, RBS,...) I
DS 27.6: Talk
Wednesday, March 13, 2013, 18:30–18:45, H32
In situ control of the structure formation of PVD hard coatings: periodic modulation of the microstructure — •Marthe Kaufholz1, Bärbel Krause1, Sunil Kotapati1, Michael Stueber2, Sven Ulrich2, Miguel Mantilla3, and Tilo Baumbach1,4 — 1IPS, KIT, Germany — 2IAM-AWP,KIT,Germany — 3MPI for Intelligent Systems, Germany — 4ANKA, KIT, Germany
Hard coatings such as Vanadium Carbide (VC1−x) are nowadays commonly used for improving the life-time of tools.
Multilayer systems are one way to enhance the hardness of such coatings. They usually consist of alternating layers of two different materials.
In situ X-ray Reflectivity measurements at the synchrotron ANKA and ex situ Transmission Electron Microscopy studies showed that the density of thin VC1−x films depends on the sputtering conditions.
A two layer system with different densities could be grown by varying the gas flow of the sputter gas.
By repeating this process periodically, a multilayer system was successfully created.
Such a multilayer system formed by only one material simplifies the synthesis process and is of great interest for optical applications.