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Regensburg 2013 – scientific programme

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DS: Fachverband Dünne Schichten

DS 6: Focus Session: Ion Beam Induced Surface Patterns II

DS 6.5: Talk

Monday, March 11, 2013, 15:45–16:00, H8

Tuning the uniaxial magnetic anisotropy of Fe thin films by using nano-rippled Si (100) substrates — •Sarathlal Koyiloth Vayalil1, Ajay Gupta2, and Stephan V. Roth11HASYLAB at DESY, Notkestr. 85, D-22603, Hamburg, Germany. — 2UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore, India.

In this work, an alternative and effective way of tuning and tailoring the magnetic properties of Fe thin film by using nano-rippled Si(100) substrates prepared by low energy ion beam sputtering have been studied. The average wavelength and modulation depth of nano-rippled Si (100) substrate is in the order of 32 nm and 1.2 nm. Evolution of the magnetic properties of ultra thin Fe film on nano-rippled Si (100) substrate has been studied using in-situ MOKE measurements. Fe film on nanorippled Si surface exhibits a magnetic dead layer of 0.9 nm because of possible intermixing of Fe with Si to form non-magnetic silicide. It exhibits a strong uniaxial magnetic anisotropy with its easy axis along a direction normal to the ripple wave vector. The magnetic anisotropy is found to be decreasing with increasing film thickness. From the in-situ resistivity measurements done simultaneously along and normal to the ripple wave vector shows, a clear anisotropy in the growth behavior along and normal to the ripple wave vector. Atomic force microscopy and GISAXS measurements on Fe thin films with different thicknesses shows that, initially the film conforms the morphology of the rippled substrate and later it vanishes.

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