DPG Phi
Verhandlungen
Verhandlungen
DPG

Regensburg 2013 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

HL: Fachverband Halbleiterphysik

HL 67: Focus Session (Posters): Crystalline n-type semiconducting oxides - SnO2, Ga2O3, and In2O3 for novel devices

HL 67.8: Poster

Mittwoch, 13. März 2013, 16:00–20:00, Poster A

Electronic properties of Si-doped (Ga,In)2O3 PLD thin films — •Marcus Purfürst, Stefan Müller, Zhipeng Zhang, Holger von Wenckstern, and Marius Grundmann — Universität Leipzig, Semiconductor Physics Group, Institut für Experimentelle Physik II, Leipzig, Germany

The wide bandgap oxide semiconductor β-Ga2O3 (Eg = 4.9 eV at RT) is a promising material for the realization of solar-blind photodetector applications like flame detection or missile warning systems. In order to tune the onset of the photo response as desired we investigated in a first step the incorporation of In into the Ga2O3 matrix and the change of the bandgap in dependence on the incorporated In content. The Si-doped (Ga,In)2O3 thin films were grown by pulsed laser deposition on c-plane sapphire substrates. Thin films grown at 730 C from a Ga2O3 target containing, for example, 1wt.% SiO2 and 2wt.% In2O3 are single crystalline with (-2 0 1)-orientation for oxygen growth pressures (pO2) up to 2×10−3 mbar. For higher pO2 polycrystalline thin films are obtained. According to the Hall measurements the conductivity shows a maximum of 63 S/m at a growth pressure of 2×10−3 mbar. The absorption edge decreases with increasing pO2 from 4.8 eV to 4.65 eV in the investigated pressure range. Compared to binary β-Ga2O3 thin films, In2O3 leads to an increased conductivity and a reduction of the optical band gap.

100% | Mobil-Ansicht | English Version | Kontakt/Impressum/Datenschutz
DPG-Physik > DPG-Verhandlungen > 2013 > Regensburg