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Regensburg 2013 – scientific programme

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O: Fachverband Oberflächenphysik

O 8: Surface Chemical Reactions and Heterogeneous Catalysis I

O 8.7: Talk

Monday, March 11, 2013, 12:00–12:15, H33

Interfacial complexation reaction in vacuo by metal-organic chemical vapour deposition — •Anthoula C. Papageorgiou1, Sybille Fischer1, Seung Cheol Oh1, Francesco Allegretti1, Alissa Wiengarten1, Knud Seufert1, Saranyan Vijayaraghavan1, Katharina Diller1, Robert G. Acres2, Kevin C. Prince2, Florian Klappenberger1, Willi Auwärter1, Joachim Reichert1, and Johannes V. Barth11Physik Department E20, Technische Universität München, 85748 Garching, Germany — 2Sincrotrone Trieste, 34149 Basovizza, Italy

The fabrication and control of metal coordination compounds or architectures at well-defined interfaces is a thriving research domain with promise for various areas, including single-site catalysis, molecular magnetism, light-harvesting and molecular rotors and machines. To date such systems have been realized either by grafting prefabricated metal-organic complexes or by protocols combining molecular linkers and single metal atoms at the interface. Here we report a different pathway employing metal-organic chemical vapour deposition, as exemplified by the reaction of meso-tetraphenylporphyrin derivatives on atomistically clean Ag(111) with a metal precursor under vacuum conditions. STM, XPS and NEXAFS reveal the formation of a meso-tetraphenylporphyrin cyclodehydrogenation product that readily undergoes metalation after exposure to the metal precursor vapour and thermal treatment. A self-terminating porphyrin metalation protocol, which proceeds without additional surface-bound by-products, yielding a single, thermally robust layer of metalloporphyrins, is discovered.

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