Dresden 2014 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 37: Poster Session 2

CPP 37.35: Poster

Mittwoch, 2. April 2014, 15:00–19:00, P3

Influence of Substrate-Solvent Interactions on Strongly Adsorbed Polymer Layers — •Daniel Geiger, Kirsten Dammertz, Masoud Amirkhani, and Othmar Marti — Institute for Experimental Physics, University of Ulm

Adsorption of poly(methyl methacrylate) (PMMA) on solid substrates forms pseudobrush-like layers. It was found, that even though the adsorption energy of a single chain segment is relatively low, such a layer can be practically irreversibly adsorbed [1] and cannot be removed by rinsing with solvent. Often, e. g. in lithography, such a residual layer is a crucial issue.

We investigated the adsorption of porous monolayers of PMMA on mica and silicon. This enables interaction of the solvent with the substrate leading to a translation and agglomeration as well as partial removal of the polymer on mica. That is not only possible by using the solvent chloroform, but also when using water, in which PMMA is insoluble. Additionally, we observed that annealing has a minor effect on the adsorption strength of such a layer. If applied to a dense layer, washing doesn't cause dewetting or removal of the film.

On silicon substrates movement for both applied liquids is suppressed, but a collapse of single chains was observed when rinsed with water.

[1] P. Frantz and S. Granick, Kinetics of Polymer Adsorption and Desorption, Phys. Rev. Lett., 66, 899-902, 1991