Dresden 2014 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 43: Poster II: Organic thin films; Atomic layer deposition, Thin film characterization: Structure analysis and composition (XRD, TEM, XPS, SIMS, RBS, ...)
DS 43.11: Poster
Donnerstag, 3. April 2014, 16:00–19:00, P1
Influence of the short interaction range of C60 on nucleation and step-edge barrier during growth — •Sebastian Bommel1,2, Nicola Kleppmann3, Sabine H.L. Klapp3, and Stefan Kowarik2 — 1Deutsches Elektronen-Synchrotron (DESY), Notkestr. 85, D-22607 Hamburg, Germany — 2Institut für Physik, Humboldt-Universität zu Berlin, Newtonstr. 15, D-12489 Berlin, Germany — 3Institut für Theoretische Physik, Technische Universität Berlin, Hardenbergstr. 36, D-10623 Berlin, Germany
Atoms, molecules and colloids show different growth phenomena attributed to their different phase diagrams, particle sizes and interaction ranges. Here, we report on the influence of the short interaction range of the fullerene C60 on nucleation and step-edge barrier [1]. Quantitative agreement between real-time x-ray scattering experiments during molecular growth with kinetic Monte Carlo (KMC) simulations allow us to analyze the particle-resolved dynamics of C60 on the surface. Compared to atoms, we find relatively long surface diffusion times before the molecules are immobilized at islands. We attribute these to the colloid-like, short-ranged character of C60-interactions [2]. However, the step-edge barrier of C60 differs from colloids in that it is not a pseudo-step-edge barrier arising from lower diffusion probability at a step-edge, but a true energetic barrier as is observed for atoms. Thus, our findings will help to gain insight into nucleation and surface growth processes between the scales of atomic and colloidal systems.
[1] S. Bommel, N. Kleppmann et al., submitted [2] S. P. Tewari et al., Int. J. Mod. Phys. B 24, 4281 (2010)