Dresden 2014 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 43: Poster II: Organic thin films; Atomic layer deposition, Thin film characterization: Structure analysis and composition (XRD, TEM, XPS, SIMS, RBS, ...)
DS 43.31: Poster
Donnerstag, 3. April 2014, 16:00–19:00, P1
Measurement of lattice parameters of ultrathin films with an improved Guinier diffractometer — •Markus Meyl and Arno Ehresmann — Institute of Physics and Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Heinrich-Plett-Straße 40, D-34132 Kassel
Lattice parameters of ultrathin films are quantified with the X-ray Guinier thin film diffractometer Huber G 653. One advantage of this Guinier diffractometer includes the use of a focussing monochromator between the X-ray tube and the sample for achieving strictly monochromatic X-rays. Another benefit lies in the very small angle of incidence (< 10∘) between the incident X-rays and the surface of the sample to attain a large distance in the ultrathin films and thereby higher diffraction intensities. Furthermore the sample surface is aligned with height accuracy by utilizing a home built adjustment stage. The measurement setup behind the monochromator is the one of a Seemann-Bohlin camera. In this camera the focal line of the monochromator, the surface of the sample and the detector entrance slit are situated on a constant focussing cylinder. Before a measurement the angle of incidence is appointed and reflected X-rays are measured when Bragg’s law is fulfilled. As a consequence the Guinier thin film diffractometer is especially suitable for analysing thin polycrystalline films on a crystalline or amorphous substrate. From the diffraction spectrum e.g. lattice parameters can be calculated. Exemplary results of Si / Cu / Ir17Mn83 / Ti samples deposited by radio frequency sputtering will be presented.