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DY: Fachverband Dynamik und Statistische Physik
DY 41: Poster - Pattern/ Nonlinear Dyn./ Fluids/ Granular/ Critical Phen.
DY 41.3: Poster
Donnerstag, 3. April 2014, 17:00–19:00, P3
Phenomenological simulations of metal layer formation during sputter deposition — •Sven-Jannik Wöhnert1, Gunthard Benecke1,2, Matthias Schwartzkopf1, and Stephan V. Roth1 — 1DESY, Notkestr. 85, D-22607 Hamburg, Germany — 2Max Planck Institute of Colloids and Interfaces, Department of Biomaterials, Am Mühlenberg 1 OT Golm, D-14476 Potsdam, Germany
Sputter deposition is one high-throughput method to install with highest rates patterned nanostructures on surfaces. Grazing incidence small-angle X-ray (GISAXS) scattering nowadays delivers a wealth of information during in-situ processes and real-time observations [1,2]. To analyze the data, simulation of GISAXS pattern based on realspace structures is indispensable. Based on the results of [1], we therefore simulate the in-situ experiments by continuous deposition of gold atoms on a silicon surface and follow their arrangement into clusters using Monte-Carlo methods. As boundary conditions, we impose the successful geometric model of [1]. Therefore, we are able to image the cluster layer built-up during the continuous depostion of Au atoms during the sputter process. We present quantitative visualization of the different growth modes of the real-time experiment. Especially we are able to observe coalescence, contact angle and diffusion on the nanoscale.
[1] Schwartzkopf et al., Nanoscale 5, 5053-5062 (2013)
[2] Shun et al., J. Phys. Chem. Lett., 3170-3175 (2013)