Dresden 2014 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 83: Graphene: Adsorption, Intercalation, Doping (O jointly with DS, HL, MA, TT)
O 83.9: Vortrag
Donnerstag, 3. April 2014, 18:00–18:15, WIL C107
Li intercalation at the graphene/Cu interface: An electronic structure view of synchrotron-based spectroscopy — •Liang Zhang1,2, Jinghua Guo2, and Junfa Zhu1 — 1National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei, 230029, China — 2Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, 94720, USA
The synthesis of graphene on metal surfaces (such as Ni, Pd, Ru or Cu) by chemical vapor deposition (CVD) is one of the most promising, inexpensive and readily accessible methods to prepare single-layer graphene, which is a prerequisite for the fabrication of graphene-based electronic devices. In particular, graphene grown on Cu foils over large areas has allowed access to high quality of this material.
In this presentation, we report our recent studies on the electronic structure of graphene/Cu and Li-intercalated graphene/Cu by synchrotron-based spectroscopy. The results indicate a high degree of alignment and a slight corrugation/rippling of the graphene layer on Cu. The deposition of Li atoms on graphene surface under ultrahigh vacuum condition at room temperature results in a charge transfer from the adsorbed Li atoms to graphene. After annealing the as-deposited Li/graphene/Cu sample at 300 °C for 10 min, the Li atoms intercalate into the interface of graphene/Cu. These interfacial Li atoms show a strong passivation from oxidation environment due to the protection of graphene layer.