Berlin 2015 – wissenschaftliches Programm
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DF: Fachverband Dielektrische Festkörper
DF 6: Poster Session DF
DF 6.6: Poster
Montag, 16. März 2015, 19:00–21:00, Poster C
Müller-Matrix-ellipsometry analysis of blazed gratings produced by reactive ion beam etching — Lennart Fricke1, Carsten Bundesmann2, Renate Fechner2, Matthias Burkhardt3, Michael Helgert3, Alexandre Gatto3, Frank Frost2, •Rüdiger Schmidt-Grund1, and Marius Grundmann1 — 1Universität Leipzig, Inst. für Experimentelle Physik II, Halbleiterphysik, Leipzig, Germany — 2Leibniz-Institut für Oberflächenmodifizierung e.V, Leipzig, Germany — 3Carl Zeiss Jena GmbH, Jena, Germany
We have modeled the optical response of balzed gratings in fused silica using the topography profiles measured by atomic force microscopy for the real space geometry. The obtained spectra are in reasonable agreement with spectra measured by Mueller-Matrix ellipsometry at angles of incidence greater 65∘ and different azimuthal orientations.
For the simulation of the Mueller-Matrix spectra we employed the rigorous coupled wave approach. The dielectric function of fused silica was taken from a database, thus our modelling procedure is free of any adjustable parameters.
The gratings were produced using interference lithography and reactive ion etching to transfer the pattern defined by lithography into the fused silica substrate. To characterize the sample geometry evolution during etching we investigated a series of samples with different etching times by this modelling technique.