Berlin 2015 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 19: Ion and electron beam induced processes

DS 19.6: Vortrag

Mittwoch, 18. März 2015, 11:15–11:30, H 2032

Particle redeposition during ion-beam erosion can stabilize well-ordered nanostructures — •Christian Diddens¹ and Stefan J. Linz² — ¹Eindhoven University of Technology, The Netherlands — ²Institut für Theoretische Physik, WWU Münster

We present a detailed analysis of a continuum model for the redeposition mechanism during the self-organized nanopatterning by ion-beam erosion. In particular, we investigate (i) the distribution of reattaching particles on the surface, (ii) an approximation of the latter as a function of the surface height and (iii) spatio-temporal evolutions of two-dimensional surfaces subject to combined erosion and redeposition. The most important finding is that redeposition can be an essential mechanism for the emergence of self-organized nanopatterns. This stabilizing effect can be observed for a wide range of the entering parameters.

[1] C. Diddens and S. J. Linz, EPL, 104 (2013) 17010

[2] C. Diddens and S. J. Linz, Eur. Phys. J. B, 86 (2013) 397

[3] C. Diddens and S. J. Linz, (in preparation)