Berlin 2015 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 59: Oxide and Insulator Surfaces: Structure, Epitaxy and Growth

O 59.6: Vortrag

Mittwoch, 18. März 2015, 16:15–16:30, MA 042

Ultrathin Iron-Silicate films on Ru(0001) — •Gina Peschel, Hagen Klemm, Thomas Schmidt, and Hans-Joachim Freund — Fritz-Haber-Institut der Max-Planck-Gesellschaft, Berlin, Deutschland

Iron silicate can be seen as a model system for zeolites [1], which are important for catalysis and widely used in industry as desiccant, detergent or as molecular sieves. Of special interest is the relation between the specific structure and reactivity. In our case we studied the growth only of a one to two atomic layer thin film on a Ru(0001) support by LEEM, LEED, XPS and XPEEM measurements.

We found the formation of structural domains. The size of these domains increase with temperature and Fe/Si ratio. Futhermore, XPEEM measurements indicate that the domains contain iron and Silica, while in between the domains only Silica is found. The Si2p level shows a chemical shift between Silica bound to FeO and Silica on Ru(0001)only. Beside the (2x2) spots, typical for silica, LEED shows additional spots rotated by 30 ^∘ and a Moiré structure. The unit cell of the new structure is about three percent larger than for ultra-thin silica films.

[1] R. Wlodarczyk, J. Sauer, X. Yu, J. Boscoboinik, B. Yang, S. Shaikhutdinov, H.-J. Freund, J. Am. Chem. Soc. 135 (2013), 19222-19228