Berlin 2015 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 86: Nanostructure at Surfaces: Molecular Assembly
O 86.10: Vortrag
Donnerstag, 19. März 2015, 17:30–17:45, HE 101
Selfassembly of organic semiconductor monolayer via solid-solid wetting: physico-chemical basics, controllability, process capability — •Alexander Eberle1,2,3 and Frank Trixler1,2,3 — 1Earth and Environmental Sciences, Ludwig-Maximilians-Universität München (LMU) — 2Center for NanoSciences (CeNS) — 3Deutsches Museum, München, Germany
Organic Solid-Solid Wetting Deposition (OSWD) (Trixler et al.: Chem.Eur.J. 13 (2007), 7785) enables to deposit insoluble molecules such as organic pigments and semiconductors on substrate surfaces such as graphite and graphene under ambient conditions. Important for enabling a broader application of OSWD is the exploration of its potential to easily grow and manipulate monolayers. In the presented study we use Quinacridone as a model system, an organic semiconductor and pigment, which finds extensive use in industrial applications. Results of investigations via Scanning Tunneling Microscopy (STM), particle size distribution and zeta potential analysis are presented which give a deeper insight into the physico-chemical basics, the controllability and the process capability of the OSWD technique. The results explain existing and open up new advantages (cheap and fast process, chemical and mechanical resistance, directed domain growth in micro- and nanoscale, nanomanipulation, co-adsorption), explain restrictions (domain-structure, coverage) and point towards prospective applications (band-gap engineering of graphene, Van der waals heterostructures) of OSWD for surface physics, supramolecular chemistry and carbon-based electronics.