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Berlin 2015 – scientific programme

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SYMM: Symposium Magic MAX Phases: Self-healing, Magnetism and the Next Best Graphene

SYMM 1: Magic MAX Phases: Self-healing, Magnetism and the next best Graphene

SYMM 1.2: Invited Talk

Thursday, March 19, 2015, 10:15–10:45, H 0105

Structure evolution during low temperature growth of nanolaminate thin films — •J.M. Schneider, L. Shang, H. Bolvardi, Y. Jiang, A. Al Gaban, D. Music, and M. to Baben — Materials Chemistry, RWTH Aachen University, D-52074 Aachen

V*Al*C, Cr-Al-C, Ti-Al-C and Mo-B-C and thin films were deposited by magnetron sputtering. The formation temperatures for V2AlC and Cr2AlC during sputter deposition are compared to the amorphous * crystalline transition temperatures in these material systems. The transition temperatures are determined by DSC and XRD. Based on the significantly lower synthesis temperature for Cr2AlC and V2AlC during vapor phase condensation compared to the bulk diffusion mediated amorphous * crystalline transition temperatures surface diffusion is identified as the atomic scale mechanism enabling the low temperature synthesis of MAX phase thin films. This notion is consistent with the phase formation data obtained utilizing HPPMS where the formation of nano-crystalline V2AlC MAX phase is observed in a (V,Al)2Cx matrix. An ion energy flux of >5.7 times of the conventional DC magnetron sputtering flux was identified to be prerequisite for V2AlC MAX phase formation. Based on these findings a low temperature synthesis strategy for Mo2BC was compiled. The data underline the potential of HPPMS for the low temperature synthesis of thin film nanolaminates.

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