Bochum 2015 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 11: Low Temperature Plasmas I
P 11.5: Vortrag
Dienstag, 3. März 2015, 15:25–15:40, HZO 30
Spectroscopic studies of mw plasmas containing hexamethyldisiloxane — •Andy Nave1, Felix Mitschker2, Peter Awakowicz2, and Jürgen Röpcke1 — 1INP Greifswald, 17489 Greifswald, Germany. — 2Ruhr-Universität Bochum, Allgemeine Elektrotechnik und Plasmatechnik AEPT, 44780 Bochum, Germany.
Plasmas containing organosilicon precursors are used in a variety of processes to deposit thin films with advantageous mechanical, electrical or optical properties. Since many years plasma-assisted polymerization has been based on hexamethyldisiloxane (HMDSO). To open up new fields of application the deposition of coatings in a wide range of chemical and physical properties by varying plasma parameters is a challenging subject. The key to an improved understanding of related plasma chemical phenomena is the analysis of the fragmentation of the precursor and the monitoring of transient and stable reaction products.
In mw plasmas infrared absorption spectroscopy based on Tunable Diode Laser (TDLs) and External Cavity Quantum Cascade Laser (EC-QCL) has been used to monitor the ground state concentrations of HMDSO, and of the reaction products CH4, C2H2, C2H4, C2H6, CO, CO2 and CH3 as a function of the HMDSO/O2 mixture ratio, and the applied power at various pressure values. In addition, the neutral gas temperature could be determined. Optical emission spectroscopy has been applied as complementary diagnostics in order to evaluate electron density and electron temperature.