Bochum 2015 – wissenschaftliches Programm

Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

P: Fachverband Plasmaphysik

P 5: Poster Session - Low Temperature Plasmas

P 5.19: Poster

Montag, 2. März 2015, 16:30–18:30, Foyer Audimax

Comparison of plasma emission profiles during glow discharge and arc — •Patrick Preissing, Ante Hecimovic, Volker Schulz von der Gathen, and Achim von Keudell — Ruhr Universität Bochum, Bochum, Deutschland

To sustain a discharge electrons are necessary. In a magnetron sputtering the electrons are generated at the cathode and accelerated by a cathode fall. The energetic electrons ionise the particles in front of the target, which in turn get accelerated towards the target conducting the current, and performing the sputtering. However, the mechanisms how electrons are generated differs for a different discharge. In an abnormal glow discharge such as high power magnetron sputtering (HiPIMS) secondary electron generation is a dominant mechanism. In an arc discharge thermionic and field emission electron generation is a dominant mechanism. We present the experiment where optical emission spectroscopy (OES) with an ICCD camera was performed, using different bandpass interference filters, to observe axial distribution of emission from different species (Ar I, Ar II, Al I, Al II). The OES was performed during a HiPIMS and an arc discharge. It was investigated, how the different mechanisms influence the axial emission profiles of the different discharges.