MI 4: Helium and Neon Ion Microscopy for the Analysis and Structuring on the Nanoscale
Mittwoch, 9. März 2016, 15:00–15:45, H5
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15:00 |
MI 4.1 |
Nanometer scale elemental analysis in the helium ion microscope using time of flight spectrometry — •Nico Klingner, René Heller, Gregor Hlawacek, Johannes von Borany, John Notte, Jason Huang, and Stefan Fascko
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15:15 |
MI 4.2 |
A Secondary Ion Mass Spectrometry (SIMS) add-on for Helium and Neon Ion Microscopy — David Dowsett, •Florian Vollnhals, Jean-Nicolas Audinot, and Tom Wirtz
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15:30 |
MI 4.3 |
Writing nanoscale magnets with neon using a gas field ion source microscope — •Gregor Hlawacek, Anna Semisalova, Falk Röder, Sebastian Wintz, René Hübner, Lothar Bischoff, Hannes Lichte, Kay Potzger, Jürgen Lindner, Jürgen Fassbender, and Rantej Bali
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