Regensburg 2016 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 49: Metal Substrates: Structure, Adsorption and Growth
O 49.13: Poster
Dienstag, 8. März 2016, 18:15–20:30, Poster E
Design and installation of a thermal hydrogen atom source — •Marie Schmitz1, Dominique Krull1,2, Christoph Keutner1,2, Philipp Espeter1,2, Ulf Berges1,2, and Carsten Westphal1,2 — 1Experimentelle Physik 1 - Technische Universität Dortmund, Otto-Hahn-Str. 4, D-44221 Dortmund, Germany — 2DELTA - Technische Universität Dortmund, Maria-Goeppert-Mayer-Str. 2, D-44221 Dortmund, Germany
We report on the design and installation of a thermal hydrogen atom source.
The source includes a tungsten capillary, heated radiatively by electron bombardement.
Hydrogen atoms are of substential interest in suface science, especially for thin layer experiments, semiconductor materials science, and technology.
Atomic hydrogen is not only used for surface cleaning, but also to cover surfaces in studies of adsorption, recombination, and desorption. Furthermore, it is crutial for growing layers within thin film deposition.
In this study, the hydrogen source is installed in a UHV-chamber for experimental analysis of adsorption and interaction on Si(100) surfaces, observed by scanning tunneling microscopy (STM). It can also be used for the passivation of Si-substrates. A residual gass analyser is used to assess the performance of the source.