Regensburg 2016 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 59: Photonics and Nanooptics III: Fabrication and Characterization
O 59.9: Vortrag
Mittwoch, 9. März 2016, 17:00–17:15, S051
Improved anodisation of aluminium thin films through reactive sputtering — •Fabian Patrovsky1, Vera Fiehler1, Susan Derenko1, Matthias Böhm1, Stephan Barth2, Hagen Bartzsch2, Peter Frach2, and Lukas M. Eng1 — 1Institut für Angewandte Physik, TU Dresden, Deutschland — 2Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP, Dresden, Deutschland
Anodised aluminium oxide (AAO) templates are widely used to fabricate plasmonic nanorod and nanowire arrays as well as sophisticated meta-materials [1]. However, manufacturing those structures on a substrate has always proven to be very difficult; either an elaborate membrane transfer is necessary [2] or previously deposited aluminium layers (CVD or PVD) have to be anodised directly, which often leads to poor results [3].
In this study we present a method which greatly improves anodisation of sputtered aluminium thin films. By introducing oxygen into the sputtering plasma, we create a highly amorphous aluminium layer that exhibits a very low defect density after anodisation, while yielding highly reproducible results. This approach enables us to reliably fabricate plasmonic nanorod arrays with improved optical properties.
[1] A. Eftekhari, Nanostructured Materials, Wiley-VHC, (2008)
[2] Z. Zhan and Y. Lei, ACS Nano 8, 3862 (2014)
[3] M. Es-Souni and S. Habouti, Frontiers in Metamaterials 1 (19), (2014)