Regensburg 2016 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 78: Nanostructures at Surfaces IV: Various Aspects
O 78.5: Vortrag
Donnerstag, 10. März 2016, 11:30–11:45, S052
Morphological study of formation of nanopatterned Si substrate produced by Fe assisted low energy ion beam erosion — •Sarathlal Koyiloth Vayalil1, Ajay Gupta2, and Stephan Roth1 — 1Photon Science, DESY, Notkestr. 85, D-22607 Hamburg, Germany — 2Amity Center for Spintronic Materials, Amity University, Sector 125, NOIDA 201313, India
In this work, formation of self-organized Si nanostructures induced by pure Fe incorporation during normal incidence low energy (1keV) Ar+ ion bombardment is presented. It has been observed that the incorporation of Fe affects the evolution of the surface topography. The addition of Fe generates pronounced nano patterns, such as dots, ripples and combinations of dots and ripples. The orientation of the ripple wave vector of the patterns formed is found to be in a direction normal to the Fe flow. The nanoripples with wavelength of the order of 39 nm produced is expected to be the lowest wavelength of the patterns reported on ion beam eroded structures under the incorporation of metallic impurities as per our knowledge. From the AFM and GISAXS analysis, it has been confirmed that the ripples formed are asymmetric in nature. The effect of the concentration of the Fe on morphological transition of the patterns has been studied using Rutherford back scattering measurements.