Bremen 2017 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 15: Helmholtz Graduate School II
P 15.20: Poster
Dienstag, 14. März 2017, 16:30–18:30, HS Foyer
High Current Ion Source for in-situ Sputter Yield Measurements — •Rodrigo Arredondo Parra1,2, Martin Oberkofler1, and Klaus Schmid1 — 1Max Planck Institute for Plasma Physics, Boltzmannstr. 2, D-85748, Garching, Germany — 2Technische Universität München, Boltzmannstr. 2, D-85748, Garching, Germany
HSQ-II (HochStromQuelle II) is a high current DuoPIGatron type ion source. It is an upgraded version of the decommissioned HSQ-I and mainly used for the measurement of sputter yields and retention with focus on wall materials for fusion devices. The ion beam is accelerated by voltages between 2 kV and 10 kV and mass-filtered in a magnetic sector field. A monoenergetic beam of a single species (e.g. D3+) is used for irradiation of samples in the separate implantation chamber at a base pressure of 10−8 mbar. The ion beam profile has been characterized after the dipole magnet and dedicated ion optics simulations to maximize the flux to the target are underway. Optimizing gas inflow and beam focusing grid voltage, for the measured beam footprint of approximately 0.5 cm2, ion flux densities of up to 4*1015 ions/cm2/s have been achieved. By applying suitable decelerating potentials at the target, final energies of the impinging particles between 200 eV/D and several keV/D can be achieved. The sample can be rotated for irradiation at oblique angles and heated for sample exposure at elevated temperatures. The sample weight can be assessed in situ by means of a magnetic suspension balance, allowing for in-situ sputter yield measurements. The first application of the machine will be the study of sputter yield on rough surfaces.