Bremen 2017 – wissenschaftliches Programm
P 16.3: Vortrag
Mittwoch, 15. März 2017, 09:25–09:40, HS 1010
Measurements on a high voltage pulsed substrate (PBII) in a HiPIMS process — •Sven Gauter1, Maik Fröhlich2, Wagdi Garkas2, Martin Polak2, and Holger Kersten1 — 1Institute of Experimental and Applied Physics, CAU Kiel, Germany — 2Leibniz Institute for Plasma Science and Technology, Greifswald, Germany
In a novel experiment a HiPIMS discharge was combined with plasma based ion implantation (PBII). Proper synchronization of the HiPIMS and PBII pulses allows successive and simultaneous coating and doping of the substrate surface in a complex, finely adjustable system. The delay between the HiPIMS and the PBII pulse is a critical parameter for the synchronization of the pulses. To investigate the effect of this parameter on the energy flux towards the PBII substrate, VI-probe and calorimetric measurements were performed.
The energy flux was measured utilizing a specially designed setup for indirect calorimetric measurement of the high voltage pulsed substrate. The results reveal the effect of the delay on the energy flux and ion current to the substrate for different PBII pulse durations and PBII voltages. A maximum of electrical power and energy flux was found for delay values significantly longer than the duration of the HiPIMS pulse. This maximum is explained to be caused by an ion wave/bunch which originates at the target and travels towards the substrate with the energy obtained from the sputter process. The investigation of different PBII and HiPIMS parameters revealed additional information about the transport of the ions from the target to the substrate.