Bremen 2017 – wissenschaftliches Programm
P 25.2: Vortrag
Donnerstag, 16. März 2017, 09:00–09:15, HS 2010
Electron dynamics in magnetized technological plasmas: A kinetic description — •Ralf Peter Brinkmann and Dennis Krüger — Ruhr-Universität Bochum
Many advanced thin-film deposition processes like HIPIMS (High Power Impulse Magnetron Sputtering) or PIAD (Plasma-Ion Aided Deposition) employ magnetized plasmas at a pressure range of 0.1 to 1 Pa and a magnetic field of 10 to 100 mT. In such plasmas, the electron gyration radius rL is of the order of a millimeter, whereas the mean free path λ is much larger, typically comparable with the plasma source dimension L itself (some tens to hundreds of millimeters). It is generally acknowledged that in this regime fluid dynamics fails and a kinetic approach is required. This work employs the smallness of the parameter epsilon rL/λ*rL/L to reduce the complexity of that approach to a tractable level. As an application, the phenomenon of spoke formation in HIPIMS discharges is addressed.