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P: Fachverband Plasmaphysik

P 4: Plasma Technology

P 4.2: Talk

Monday, March 13, 2017, 14:30–14:45, HS 2010

Deposition of SiO_x coatings by means of inductively coupled plasma — •Markus Brochhagen, Vincent Layes, Marc Böke, and Jan Benedikt — Experimentalphysik II, Ruhr-Universität Bochum, Universitätsstraße 150, 44801 Bochum

SiO₂-like films can serve as barrier coatings on polymeric substrates, where the barrier properties depend on the amount of carbon inside the layer. Such layers can be produced in a plasma process using evaporated HMDSO and admixed Argon or Oxygen. This mixture influences the amount of carbon inside the layer. The less carbon is inside the layer, the better is the barrier property of the film. The process is studied under high plasma density conditions in an ICP plasma with in-situ ellipsometry, FTIR spectrometry and XPS. Additionally the thickness is measured with a profilometer. Also the impact of argon ions and metastables is investigated in a process with prolonged Ar-plasma treatments of thin SiO₂-like layers. It is tested if carbon free films can be achieved even without O₂ admixture as it was reported for atmospheric plasmas.
This work is supported by DFG within SFB-TR 87.