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P: Fachverband Plasmaphysik
P 8: Plasma Diagnostics II
P 8.6: Vortrag
Dienstag, 14. März 2017, 10:05–10:20, HS 1010
Deposition of a-C:H layers using an atmospheric pressure He/Acetylene plasma jet — •Theresa Urbanietz, Katja Rügner, Gert Willems, Achim von Keudell, and Jan Benedikt — Institut für Experimentalphysik II, Ruhr-Universität Bochum, 44780 Bochum, Germany
The deposition and treatment of a-C:H films by means of an atmospheric pressure microplasma jet with helium/acetylene mixtures has been studied by in situ FTIR spectroscopy. It is shown that the deposition rate has a saturating behaviour with increasing admixture of acetylene and reaches a maximum deposition rate of 15 nm min−1. The additional admixture of nitrogen leads to a three times faster deposition rate and an appearance of nitrogen double and triple bounds in the film. The treatment is done by alternating application of a helium/acetylene plasma and a helium/nitrogen plasma to the same deposition area. This is achieved by applying two plasma jets on a rotating substrate. In contrast to the addition of nitrogen the treatment with helium/nitrogen plasma shows an etching effect caused by nitrogen atoms and an appearance of single nitrogen bounds in the film. A treatment with a pure helium plasma in direct contact with the surface has no significant effect on the film. The analysis of the plasma with mass spectrometry shows the polymerization of C2H2 to C4H2 and C6H2 with the help of C2H.