Dresden 2017 – wissenschaftliches Programm
CPP 27.5: Vortrag
Dienstag, 21. März 2017, 15:00–15:15, ZEU 114
Modeling inscription of surface relief gratings on azobenzene polymers — •Marina Saphiannikova1 and Jaroslav Ilnytskyi1,2 — 1Leibniz-Institut für Polymerforschung, Hohe Str. 6, 01069 Dresden, Germany — 2Institute for Condensed Matter Physics, Svientsitskii Str. 1, 79011 Lviv, Ukraine
Azobenzene polymers proved to be invaluable in the fields of photopatterning and photomechanics. The direction of deformation can be easily controlled by illumination with linearly polarized light. Recently we showed with the help of coarse-grained simulations that a complex process of anisotropic stochastic photoisomerization can be reduced to a deterministic orientation in a field of the effective potential . Presently we mimick on a coarse-grained level inscription conditions for two intensity and one polarization interference patterns commonly used to grow the surface relief gratings (SRGs). The temperature of azo-polymer film under illumination is kept very close to its value in darkness. We observe how the azo-material gradually moves from highly illuminated spots under intensity interference patterns building a sinusoidal SRG. The SRG inscribed by the polarization pattern appears to be a superposition of two SRGs inscribed by two intensity patterns, whose superposition reproduces the polarization pattern. This explains why complicated surface patterns can be inscribed using multiple steps.
 J.M. Ilnytskyi, M. Saphiannikova, ChemPhysChem, 16, 3180, 2015.