Dresden 2017 – wissenschaftliches Programm

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CPP: Fachverband Chemische Physik und Polymerphysik

CPP 69: Thin Films, Nanostructures and Nanoparticles II

CPP 69.1: Vortrag

Freitag, 24. März 2017, 10:15–10:30, ZEU 114

Shear Exfoliation of layered silica in organic solvents — •Michael Huth and Veit Wagner — Jacobs University Bremen, Campus Ring 1, 28759 Bremen, Germany

There is a large interest in the delamination of layered silica for the production of nanocomposites. Those nanocomposites can be used for several applications, like reinforcement, flame retardant agent, or barrier applications. For all those applications, a uniform dispersion of monolayers in the nanocomposites is essential for the improvement of overall performance. In this work, layered silicaes with different intercalated molecules, so-called intercalated agents are used. Those agents change the interlayer distance between the layers forming the silica flake. The influence of those changes on the dispersion process, as well as on the morphology of the dispersed plates is investigated. The dispersions of clay are processed using a shear exfoliation in chloroform. The dispersions consist of layered silica flakes of ~ 1.5 μm length and with a thickness down to 3 nm, equivalent less than four monolayers. The obtained high aspect ratio flakes, were characterized by microscopy (TEM and AFM), UV-Vis and gravimetric measurement. The results show that high interlayer distances favor a stable dispersion of layered silicaes with a thickness of just a few monolayers.

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