Dresden 2017 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 36: Postersession I
DS 36.1: Poster
Mittwoch, 22. März 2017, 17:00–19:00, P2-EG
Interaction of oxygen with plasma-deposited Si:N:H primer coatings — •Lisa Wurlitzer1, Sebastian Dahle2, and Wolfgang Maus-Friedrichs1,2 — 1Clausthal Centre of Material Technology, 38678 Clausthal-Zellerfeld, Germany — 2Insitute for Energy Research and Physical Technology
The coatings are applied in a two-step process which is carried out through dielectric barrier discharge (DBD) plasma treatments. The DBD plasma is used in the first processing step along with a gaseous mixture of silane and nitrogen to deposit the primer film. In the second processing step, the primer film is converted into a silicon oxide coating. Previous measurements show that this conversion yields stoichiometric silicon dioxide when employing a DBD plasma treatment in air or pure oxygen, while an exposure to air at atmospheric pressures without DBD plasma leads to a partial conversion of the film. This high reactivity against oxygen is now investigated by exposure to small vapor pressures of oxygen in an ultra-high vacuum chamber, again without a DBD plasma treatment. Photoelectron spectroscopy is employed to study the interaction of oxygen with the Si:N:H primer coating.