Dresden 2017 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 36: Postersession I
DS 36.5: Poster
Mittwoch, 22. März 2017, 17:00–19:00, P2-EG
Electrochemical Deposition of Porous Nickel Oxide Films as Electrodes in Electrochromic Devices and Solar Cells — •Simon P. Schneider1,2, Christian Lupo1,2, and Derck Schlettwein1,2 — 1Justus-Liebig-University Giessen, Institute of Applied Physics — 2Justus-Liebig-University Giessen, Laboratory for Materials Science
Nickel oxyhydroxide films were deposited onto transparent conductive oxide substrates via electrochemical deposition in an aqueous bath containing nickel sulfate and ammonia. The deposition was carried out using cyclic voltammetry in a three-electrode setup, where a Ag/AgCl-electrode was used as reference and a platinum sheet as counter electrode. After deposition, the films were treated at different temperatures to obtain porous nickel oxide. Furthermore, the concentrations and ratios of nickel sulfate and ammonia in the solution were adjusted to optimize the deposition. The film morphology was investigated using scanning electron microscopy revealing homogenously porous film surfaces and a high reproducibility. Different annealing temperatures and bath concentrations did not affect size and shape of the pores. However, the annealing temperature seems to have an influence on the oxidation state of nickel and thus on the optical properties of the films.