Dresden 2017 – wissenschaftliches Programm

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MI: Fachverband Mikrosonden

MI 5: Session on Nanostructuring Beyond Conventional Lithography

MI 5.2: Vortrag

Mittwoch, 22. März 2017, 11:45–12:00, MER 02

Additive Fabrication of Nanostructures with Focused Soft X-Rays — •Andreas Späth¹, Fan Tu¹, Florian Vollnhals², Hubertus Marbach¹, and Rainer H. Fink¹ — ¹FAU Erlangen-Nürnberg, Physical Chemistry II, Erlangen, Germany — ²Luxembourg Institute of Science and Technology (LIST), Materials Research and Technology, Belvaux, Luxembourg

We have developed a novel technique for the deposition of metallic nanostructures by illuminating gas phase precursors with focused soft X-rays in a zone plate based scanning transmission X-ray microscopy (STXM) setup. With this technique we have been able to produce localized Co and Mn nanostructures with growth rates and purity competitive with electron beam induced deposition (EBID) [1]. We demonstrate that our approach exhibits significant selectivity with respect to incident photon energy leading to enhanced growth for resonant absorption energy of the precursor molecule. This finding opens a new field of photon energy selective deposition from precursor mixtures and deposition from various precursors within one production cycle. The impact of several deposition parameters on the growth rate, such as illumination time, precursor pressure and multi-sweep experiments are discussed with respect to a deeper understanding of deposition processes and optimization of the procedure. Furthermore, we discuss routes to the formation of magnetic deposits.

[1] A. Späth et al., RSC Advances, 2016, 6, 98344.