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O: Fachverband Oberflächenphysik
O 97: Nanostructures at Surfaces: Molecular Systems II
O 97.8: Talk
Thursday, March 23, 2017, 17:15–17:30, REC/PHY C213
Trimethylsilyl protected alkyne precursors on metal surfaces — •Liding Zhang1, Yi-Qi Zhang1, Zhi Chen2, Mateusz Paszkiewicz1, Tao Lin1, Mario Ruben2, Johannes Barth1, and Florian Klappenberger1 — 1TU München, Physik E20, Garching, Deutschland — 2Karsruher Institut für Technologie, Institute of Nanotechnology, Eggenstein-Leopoldshafen, Deutschland
We report on the application of trimethylsilyl(TMS) terminated alkyne precursors for opening new pathways for fabricating novel 1-D and 2-D carbon nano- materials on metal surfaces.
The commonly employed organic molecular beam epitaxy limits the weight of employed precursors as with increased weight, the temperature for evaporation can rise above the temperature required for intermolecular reactions. The chemical inertness of TMS protection groups inhibits intermolecular reactions and thus allows the evaporation of larger and heavier alkyne precursors.
All utilized TMS-protected alkyne precursors were successfully evaporated onto Cu, Au and Ag surfaces. Investigations with low temperature STM imaging show dense packed self-assembled supramolecular islands. Thermal annealing shows TMS groups exhibiting different levels of inertness on different metal surfaces and triggers TMS group cleave off and a subsequent two step reaction pathway reminiscent of on-surface Glaser coupling, allowing the formation of covalently bonded structures with varying degrees of structural regularity.