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Dresden 2017 – wissenschaftliches Programm

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SYNS: Symposium Nanostructuring Beyond Conventional Lithography

SYNS 1: Symposium Nanostructuring Beyond Conventional Lithography
(MI with DS, DF, HL, MM and VA)

Mittwoch, 22. März 2017, 15:00–17:45, HSZ 02

15:00 SYNS 1.1 Hauptvortrag: The Limits to Lithography: How Electron-Beams Interact with Materials at the Smallest Length Scales — •Karl K. Berggren
15:30 SYNS 1.2 Hauptvortrag: High precision fabrication for light management at nanoscale — •Saulius Juodkazis and Armandas Balcytis
16:00 SYNS 1.3 Hauptvortrag: Directed self-assembly of performance materials — •Paul Nealey
  16:30 15 min. break
16:45 SYNS 1.4 Hauptvortrag: Nanometer accurate topography patterning using thermal Scanning Probe Lithography — •Armin W. Knoll
17:15 SYNS 1.5 Hauptvortrag: High resolution 3D nanoimprint lithography — •Hartmut Hillmer
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