Mainz 2017 – wissenschaftliches Programm
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Q: Fachverband Quantenoptik und Photonik
Q 44: Photonics II
Q 44.4: Vortrag
Donnerstag, 9. März 2017, 11:45–12:00, P 11
Diffraction-limited imaging with 3D printed complex mesoscale objectives — •Simon Ristok1, Simon Thiele2, Timo Gissibl3, Alois Herkommer2, and Harald Gießen1 — 1Universität Stuttgart, 4. Physikalisches Institut — 2Universität Stuttgart, Institut für technische Optik — 3Nanoscribe GmbH, Eggenstein-Leopoldshafen
Complex three dimensional structures on the micrometer scale can be fabricated by focusing a femtosecond laser at 780 nm into a UV sensitive photoresist. The photoresist is polymerized via two-photon absorption at 390 nm in a small volume element around the laser focus, resulting in sub-micrometer resolution. By moving the focus through the photoresist arbitrary shapes can be produced.
Particularly the high resolution renders this direct laser writing technique suitable for the fabrication of high quality optical elements. The achievable size ranges from a few micrometers up to several millimeters. Apart from simple spherical lenses, optical systems with multiple lenses, such as doublet or triplet objectives can be printed.
In this work we focus on objectives with diameters of several 100 micrometers. They show excellent imaging properties, with optical resolution close to the diffraction limit, even for large fields of view. Furthermore, we are able to print our microoptics directly on various surface materials, e.g. CMOS sensors or optical fibers, opening up a wide range of possible applications.